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Tantalum Powder (Ta Powder)-Low oxygen

Material Code:MP-00001 Tantalum powder has a series of excellent properties such as a high melting point, low vapor pressure, good cold processing performance, high chemical stability, strong resistance to liquid metal corrosion, and a large dielectric constant of the surface oxide film. Cassifications include capacitor-grade tantalum powder, metallurgical tantalum powder, and medical

Product Description

Tantalum powder has a series of excellent properties such as a high melting point, low vapor pressure, good cold processing performance, high chemical stability, strong resistance to liquid metal corrosion, and a large dielectric constant of the surface oxide film. Our tantalum powder has the characteristics of high purity (99.95%), low oxygen content (500ppm), and small particle size (1-3um).

 

Item No.

Description

Purity

Lot Size

MP-00001-3N5(SR)

Tantalum Metal Powder 
Metallurgical Grade 
-150 mesh or -325 mesh.

Ta > 99.95% (metals basis) 
Nb < 0.010%, Fe < 0.005%, Ni < 0.005%, Si < 0.015% 
O < 0.2%, H < 0.005%, N < 0.01%, C < 0.015%

10 kg 
50 kg 
100 kg

MP-00001-3N5(EB)

Tantalum Metal Powder 
Electron Beam Grade 
-150 mesh or -325 mesh.

Ta > 99.95% (metals basis) 
Nb < 50 ppm, Fe < 25 ppm, Ni < 50 ppm, Si < 10 ppm 
O < 2000 ppm, N < 50 ppm, C < 50 ppm

10 kg 
50 kg 
100 kg

MP-00001-3N5(CP)

Tantalum Metal Powder 
Various Capacitor Grades 
Ask for detailed specs.

Ta > 99.95% (metals basis) 
O 1600~2800 ppm, N 70~300 ppm, C 70~100 ppm 
Nb < 50 ppm, Fe+Cr+Ni < 150 ppm, Si < 10 ppm 
Specific capacitance: 3,500 to 40,000 µfv/g

10 kg 
50 kg 
100 kg

MERCHANT offers broad selections of bulk density, particle size range, and purity. The purity includes commercially pure, 3N (99.9%), 3N5 (99.95%), 4N (99.99%), and 4N5 (99.995%). 

Metallurgical Tantalum Powder

Description

Standard: YS/T 259-2012

Grade: FTa-1, FTa-2, FTa-3, FTa-4

Purity: 99.5%~99.95%

Applications: Widely used for powder metallurgy to produce various tantalum processing materials and alloy additives.

 

 

Chemical Composition

 

 

Elements

Metallic Impurities (%)

FTa-1

FTa-2

FTa-3

FTa-4

Ta

99.95%

99.95%

99.93%

99.50%

H

0.0030

0.0030

0.0050

0.0100

O

0.1500

0.1800

0.2000

0.3000

C

0.0050

0.0080

0.0150

0.0200

N

0.0050

0.0150

0.0150

0.0450

Fe

0.0030

0.0050

0.0050

0.0200

Ni

0.0030

0.0050

0.0050

0.0200

CR

0.0030

0.0030

0.0050

0.0200

Si

0.0030

0.0050

0.0100

0.0300

Nb

0.0030

0.0050

0.0050

0.0300

W

0.0020

0.0030

0.0030

0.0100

Mo

0.0010

0.0020

0.0020

0.0100

Ti

0.0010

0.0010

0.0010

0.0100

MN

0.0010

0.0010

0.0010

0.0010

Sn

0.0010

0.0010

0.0010

0.0010

Ca

0.0010

0.0010

0.0010

0.0010

Al

0.0010

0.0010

0.0010

0.0010

Cu

0.0010

0.0010

0.0010

0.0010

Mg

0.0010

0.0050

0.0100

0.0100

P

0.0015

0.0030

Physical Properties

 

 

Grade

Bulk Density

(g/cm3)

FSSS

(μm)

Screening Particle Size

(μm)

FTa-1

measured value

2.0~10.0

 

 

154μm number of sieves ≥95%

FTa-2

3.0~5.0

3.0~10.0

FTa-3

2.3~5.0

2.5~8.5

 

FTa-4

2.3~5.0

2.5~8.5

315μm number of sieves ≥95%

 

Remark: 1) Special requirements to be agreed upon by the supplier and buyer. 2) The typical cos for our products are available for review upon request and samples are available for immediate      evaluation.

 

Tantalum Powder Applications

Tantalum metal powder can be used in sputtering targets, alloys, thermal and chemical resistant coating, 3D printing (additive manufacturing), and electrolytic capacitors. There are four types of powders:

  •  Nodular powder from the chemical reduction of tantalum salt or oxide. The resulting powder is aggregated consisting of primary particles and pores. It has a relatively low density and high surface area.
  • EB powder from hydride and de-hydride of electron bean or arc melted ingot. The particle of this powder is typically angular and non-aggregated.
  • Capacitor Grades powder can be used to manufacture high-performance chip or dipping-type tantalum electrolyte capacitors.
  • Spherical powder from plasma inert gas atomization. This generates a spherical shape with a smooth surface that has excellent flow characteristics. The powder is particularly suitable for 3D printing. 
  • Tantalum Powder Packing

    The tantalum powder is carefully handled to prevent damage during storage and transportation.

  •  

    Superior product  Tantalum Powder 

  • Tantalum Powder, 99.95%, -325 mesh
  • Tantalum Powder, 99.95%, -200 mesh
  •   *Special particle sizes can be customized upon your request.

  • Fine particle size tantalum powder, 99.95%, D(50): <3μm, D(90): <10μm
  • Low oxygen tantalum metal Powder, 99.95%, O<1000 ppm
  • Spherical Tantalum (Ta) Powder
  • Spherical Tantalum Tungsten Alloy (Ta2.5W, Ta10W) Powder
  •  
  • Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

 

Contact Us

Email: 13819865442@163.com

Email: 17621899960@163.com

Mob.: +86 138 1986 5442

WeChat: Stanbobobobo

Add.: Room JT24360, Building 4, Area B, 925 Yecheng Road, Jiading Industrial Zone, Shanghai

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